Swagelok^® Ultrahigh-Purity Diaphragm Valves for Atomic Layer Processing (ALD7 Series)

The Swagelok^® ALD7 ultrahigh-purity diaphragm valve for atomic layer deposition (ALD) processing enables semiconductor tool manufacturers and chip fabricators to increase viable chip yields and enhances profitability by enabling the flow consistency and capacity, actuator speed, and performance at high temperatures necessary to overcome production processes limitations. It provides consistent performance from valve to valve, dose to dose, and chamber to chamber over an ultrahigh cycle life.

The Swagelok ALD7 valve:

• Delivers quick, precise dosing over the course of millions of cycles in even the most demanding applications and features enhanced actuator technology with a response time as low as 5 ms
• Is resistant to corrosive gases with a valve body comprised of proprietary ultrahigh-purity Swagelok 316L VIM-VAR stainless steel
• Can be heated up to 200°C while keeping the pneumatic actuator below maximum operating temperature of 150°C
• Delivers a flow coefficient (C_v) up to 0.7 (with optional custom (factory-set) versions available that deliver a flow coefficient of 0.5–0.7 C_v)
• Maintains the same footprint as Swagelok industry-standard ALD valves and features an integrated thermal isolator to maximize limited space near the reaction chamber

See ALD7 Valves Up Close

ALD7 Valve Specifications

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