
Swagelok® Atomic Layer Deposition (ALD) Valves
Swagelok ultrahigh-purity atomic layer deposition (ALD) valves offer the ultrahigh cycle life, high-speed actuation, flow rates, thermal immersibility, and extreme cleanliness needed to enable precise dosing and maximize chip yield in advanced semiconductor manufacturing applications.
Request ALD Valve InformationSince introducing the world to ALD valves, we have worked closely with semiconductor tool OEMs and fabs to deliver advanced ALD valve technology that provides the extreme levels of precision, consistency, cleanliness, and high cycle life necessary to keep up with the quick pace of innovation in the marketplace. Swagelok® ALD valves can support increased chip production efficiency and overcome the challenges that are often associated with ALD processes.
Our ALD ultrahigh-purity valves feature:
- Ultrahigh cycle life with high-speed actuation
- Cv ranging from 0.27 to 1.7
- Temperature capability up to 392°F (200°C) for specified models
- Electronic or optical actuator position-sensing option
- Cleanliness suitability for ultrahigh-purity applications
- Modular surface mount, tube butt weld, and VCR® end connections
Atomic Layer Deposition (ALD) Valves Categories

Ultrahigh-Purity Diaphragm Valves, ALD3 and ALD6 Series
ALD3 and ALD6 diaphragm valves offer ultrahigh cycle life, high-speed actuation, and strong performance in atomic layer deposition applications.
Ultrahigh-Purity Diaphragm Valves, ALD7 Series
The Swagelok® ALD7 ultrahigh-purity diaphragm valve offers the precision and consistency needed to maximize chip yields in semiconductor manufacturing applications.

Ultrahigh-Purity Valves for High-Flow Applications, ALD20 Series
Advance atomic layer deposition technology with flow rates 2–3x higher than other ALD valves with the ALD20 ultrahigh-purity valve.
Atomic Layer Deposition (ALD) Valve Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
■ サイクル・ライフが非常に優れ、高速で開閉可能/■ 流量係数(Cv 値):0.27 から1.7 まで/■ 最高使用温度:200°C(ALD20 の場合)/■ オプション:電気式インジケーター、光学式ポジション・センサーなど/■ 超高純度用途に適した316L VIM-VAR ステンレス鋼製ボディ/■ エンド・コネクション・タイプ:集積モデル、チューブ突き合わせ溶接、VCR ® メタル・ガスケット式面シール継手

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Find out how the latest innovation in atomic layer deposition (ALD) valve technology is changing the game for high-tech semiconductor manufacturers.
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