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Swagelok^® Atomic Layer Deposition (ALD) Valves

Swagelok ultrahigh-purity atomic layer deposition (ALD) valves offer the ultrahigh cycle life, high-speed actuation, flow rates, thermal immersibility, and extreme cleanliness needed to enable precise dosing and maximize chip yield in advanced semiconductor manufacturing applications.

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Since introducing the world to ALD valves, we have worked closely with semiconductor tool OEMs and fabs to deliver advanced ALD valve technology that provides the extreme levels of precision, consistency, cleanliness, and high cycle life necessary to keep up with the quick pace of innovation in the marketplace. Swagelok^® ALD valves can support increased chip production efficiency and overcome the challenges that are often associated with ALD processes.

Our ALD ultrahigh-purity valves feature:

Ultrahigh cycle life with high-speed actuation
C_v ranging from 0.27 to 1.7
Temperature capability up to 392°F (200°C) for specified models
Electronic or optical actuator position-sensing option
Cleanliness suitability for ultrahigh-purity applications
Modular surface mount, tube butt weld, and VCR^® end connections

See How ALD Valves Solve Challenges

Atomic Layer Deposition (ALD) Valve Catalogs

Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.

超高純度用バルブ原子層プロセス用

■ サイクル・ライフが非常に優れ、高速で開閉可能／■ 流量係数（Cv 値）：0.27 から1.7 まで／■ 最高使用温度：200°C（ALD20 の場合）／■ オプション：電気式インジケーター、光学式ポジション・センサーなど／■ 超高純度用途に適した316L VIM-VAR ステンレス鋼製ボディ／■ エンド・コネクション・タイプ：集積モデル、チューブ突き合わせ溶接、VCR ® メタル・ガスケット式面シール継手

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