Swagelok® Ultrahigh-Purity Valves for High-Flow Atomic Layer Processing Applications (ALD20 Series)
Swagelok ALD20 ultrahigh-purity valves offer a high flow capacity ideal for atomic layer deposition processes that require low-vapor pressure precursor gases.
Request ALD20 Valve InformationThe high-flow Swagelok® ALD20 ultrahigh-purity valve provides the reliability and performance expected of Swagelok® ALD valves while also enabling previously unattainable temperature stability and flow possibilities. It enables manufacturers to experiment with different processes and low-vapor pressure chemistries to achieve the uniform gas deposition needed to develop advanced technology without significantly changing processes.
The Swagelok ALD20 valve can:
- Deliver a of 1.2 Cv flow rate in the same footprint (1.5 in.) as existing ALD valves, offering improved performance without requiring retooling
- Provide an even greater 1.7 Cv with a slightly larger (1.75 in.) standard variant—the highest flow rate currently available from an ultrahigh-cycle life, ultrahigh-purity valve
- Be immersed in a gas box from 50°F (10°C) up to 392°F (200°C), eliminating the need to isolate the actuator during heating and improving deposition consistency
- Provide enhanced corrosion resistance with 316L VIM-VAR stainless steel or Alloy 22 body material options
- Support clean operation over the course of an ultrahigh cycle life for process integrity thanks to a highly polished bellows with a 5 μin. Ra finish
- Deliver high-speed (<10ms) repeatable actuation for precise, consistent flow to meet dosing requirements
Custom-set flow coefficients are also available.
Learn How The ALD20 Valve Helps Overcome Semiconductor Processing Hurdles
ALD20 Valve Specifications
| Working Pressure | Vacuum to 20 psig (1.4 bar) |
| Burst Pressure | >3200 psig (220 bar) |
| Actuation Pressure | 70 to 90 psig (4.9 to 6.2 bar) |
| Temperature | 50° to 392°F (10° to 200°C) |
| Flow Coefficient (Cv) | 1.2 (MSM) or 1.7 (straight pattern) |
| Body Materials | 316L VIM-VAR or Alloy 22 |
| Bellows Material | Alloy 22 (5 μin. Ra finished) |
| End Connections | Type (Size): Female VCR® fitting (1/2 in.), rotatable male VCR fitting (1/2 in.), tube butt weld, 0.50 in. long (1/2 in. x 0.049 in.), modular surface-mount high-flow C-seal (1.5 in.) |
Need help with ALD valve selection?
ALD20 Series Valves Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
원자층 증착 (ALD) 용 다이어프램 밸브 고속 개폐 시에도 매우 긴 수명 유지 ; Cv 범위 0.27 ~ 0.62; 고온용 개폐기로 200°C (392°F)까지 사용가능; 전자 개폐기 위치 감지 옵션; 초고순도 사양에 적합한 316L VIM-VAR 스텐레스강 몸체; VCR®, 튜브 맞대기 용접 및 블럭 조립식 연결구
One New Valve: Three Reasons It Could Change Semiconductor Manufacturing
Find out how the latest innovation in atomic layer deposition (ALD) valve technology is changing the game for high-tech semiconductor manufacturers.
Unlock More of the Periodic TableSwagelok Resources Curated for You
Improve Semiconductor Yield with Optimized Alloys
Discover how semiconductor fabricators can improve end-to-end production yields and improve long-term profitability by selecting the right metals for critical fluid system components.
Q&A: Semiconductor Manufacturing Past, Present, and Future
Find out how collaboration between semiconductor tool OEMs, microchip manufacturers, and fluid system solutions providers has enabled the semiconductor market to keep up with the demands of Moore’s Law for decades, and where we go from here.
Производитель оптоволоконного оборудования повышает эффективность с помощью индивидуальных решений
С 1980-х годов Rosendahl Nextrom полагается на компанию Swagelok в развитии своего бизнеса. Узнайте больше о решениях, которые позволили компании опередить конкурентов и остаться в числе отраслевых лидеров.
Надежные решения в жидкостных и газовых системах для новых научно-исследовательских возможностей
Узнайте, почему финская компания-производитель криогенных рефрижераторов Bluefors доверяет компонентам и решениям Swagelok для жидкостных и газовых систем, которые способствуют развитию сферы квантовых вычислений, экспериментальной физики и других направлений.
