Swagelok® Ultrahigh-Purity Valves for High-Flow Atomic Layer Processing Applications (ALD20 Series)
Swagelok ALD20 ultrahigh-purity valves offer a high flow capacity ideal for atomic layer deposition processes that require low-vapor pressure precursor gases.
Request ALD20 Valve InformationThe high-flow Swagelok® ALD20 ultrahigh-purity valve provides the reliability and performance expected of Swagelok® ALD valves while also enabling previously unattainable temperature stability and flow possibilities. It enables manufacturers to experiment with different processes and low-vapor pressure chemistries to achieve the uniform gas deposition needed to develop advanced technology without significantly changing processes.
The Swagelok ALD20 valve can:
- Deliver a of 1.2 Cv flow rate in the same footprint (1.5 in.) as existing ALD valves, offering improved performance without requiring retooling
- Provide an even greater 1.7 Cv with a slightly larger (1.75 in.) standard variant—the highest flow rate currently available from an ultrahigh-cycle life, ultrahigh-purity valve
- Be immersed in a gas box from 50°F (10°C) up to 392°F (200°C), eliminating the need to isolate the actuator during heating and improving deposition consistency
- Provide enhanced corrosion resistance with 316L VIM-VAR stainless steel or Alloy 22 body material options
- Support clean operation over the course of an ultrahigh cycle life for process integrity thanks to a highly polished bellows with a 5 μin. Ra finish
- Deliver high-speed (<10ms) repeatable actuation for precise, consistent flow to meet dosing requirements
Custom-set flow coefficients are also available.
Learn How The ALD20 Valve Helps Overcome Semiconductor Processing Hurdles
ALD20 Valve Specifications
| Working Pressure | Vacuum to 20 psig (1.4 bar) |
| Burst Pressure | >3200 psig (220 bar) |
| Actuation Pressure | 70 to 90 psig (4.9 to 6.2 bar) |
| Temperature | 50° to 392°F (10° to 200°C) |
| Flow Coefficient (Cv) | 1.2 (MSM) or 1.7 (straight pattern) |
| Body Materials | 316L VIM-VAR or Alloy 22 |
| Bellows Material | Alloy 22 (5 μin. Ra finished) |
| End Connections | Type (Size): Female VCR® fitting (1/2 in.), rotatable male VCR fitting (1/2 in.), tube butt weld, 0.50 in. long (1/2 in. x 0.049 in.), modular surface-mount high-flow C-seal (1.5 in.) |
Need help with ALD valve selection?
ALD20 Series Valves Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
Характеристики: Сверхвысокий циклический срок службы с высокой скоростью срабатывания; Cv в диапазоне от 0,27 до 0,62; возможность работы при температуре до 392 °F (200 °C) с термостойкими приводами; вариант исполнения с электронным датчиком положения привода; подходят для применения в сверхчистых системах с корпусом из нержавеющей стали 316L VIM-VAR; торцевые соединения VCR®, под приварку встык и модульные торцевые соединения для монтажа на поверхность.
One New Valve: Three Reasons It Could Change Semiconductor Manufacturing
Find out how the latest innovation in atomic layer deposition (ALD) valve technology is changing the game for high-tech semiconductor manufacturers.
Unlock More of the Periodic TableSwagelok Resources Curated for You
Improve Semiconductor Yield with Optimized Alloys
Discover how semiconductor fabricators can improve end-to-end production yields and improve long-term profitability by selecting the right metals for critical fluid system components.
Q&A：半導体製造の過去・現在・将来
半導体装置メーカー、マイクロデバイス・メーカー、流体システム・ソリューションのプロバイダーが連携することで、数十年間にわたっていかにして半導体市場はムーアの法則の要求に追いつくことができたのでしょうか。これからの展望と併せて紹介します。
光ファイバー装置メーカー、カスタマイズされたソリューションで効率アップを実現
ローゼンダール・ネクストロム社は、1980年代からスウェージロックのサポートを受けて、ビジネスを推進してきました。競合他社とは一線を画し、業界のトップを走り続けるローゼンダール・ネクストロム社のソリューション事例を紹介します。
最先端科学で信頼できる流体システム・ソリューション
フィンランドの希釈冷凍機メーカーであるブルーフォース社が、量子コンピューターや実験物理学などに欠かせない流体システム部品やソリューションに関して、スウェージロックに信頼を寄せている理由を紹介します。