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原子层沉积 (ALD) 阀

世伟洛克® 原子层沉积 (ALD) 阀

世伟洛克超高纯原子层沉积 (ALD) 阀具有超高循环寿命、高速执行、流量、热浸没和超高洁净度,可在先进半导体制造应用中实现精确进料并尽可能地提高芯片产量。

索取 ALD 阀门信息

ALD 阀门问世以来,我们一直与半导体工具 OEM 和晶圆厂密切合作,提供的先进 ALD 阀门技术具有超高的精度、一致性、洁净度和高循环寿命,是紧跟市场快速创新步伐所必需的。世伟洛克® ALD 阀门可支持芯片生产效率的提高,并克服 ALD 工艺通常面临的挑战。

我们的 ALD 超高纯阀具有以下特点:

  • 快速动作下的超高循环寿命
  • Cv 范围从 0.27 至 1.7
  • 指定型号的承温能力高达 392°F (200°C)
  • 电子或光学执行机构位置传感选购件
  • 洁净度适合超高纯应用
  • 模块化表面安装、卡套管对焊和 VCR® 端接

了解 ALD 阀门如何应对挑战

Categorías de Válvulas de Deposición de Capas Atómicas (ALD)

Válvulas de Diafragma de Ultra Alta Pureza, Serie ALD7

Válvulas de Diafragma de Ultra Alta Pureza, Serie ALD7

La válvula de diafragma Swagelok® ALD7 de ultra alta pureza ofrece la precisión y consistencia necesarias para maximizar la producción de chips en las aplicaciones de fabricación de semiconductores.

Válvulas de Diafragma de Ultra Alta Pureza, Series ALD3 y ALD6

Válvulas de Diafragma de Ultra Alta Pureza, Series ALD3 y ALD6

Las válvulas de diafragma ALD3 y ALD6 ofrecen una larga vida útil, una actuación de alta velocidad y un gran rendimiento en aplicaciones de deposición de capas atómicas.
Válvulas de Ultra Alta Pureza para Aplicaciones de Alto Caudal, Serie ALD20

Válvulas de Ultra Alta Pureza para Aplicaciones de Alto Caudal, Serie ALD20

Tecnología avanzada de deposición de capas atómicas con caudales 2-3 veces superiores a los de otras válvulas ALD gracias a la válvula ALD20 de ultra alta pureza.

原子层沉积 (ALD) 阀目录

查找详细的产品信息,包括结构材料、额定压力和温度、选购件及配件。

应用于半导体行业的世伟洛克ALD20超高纯阀洁净室组装

一种全新的阀门:该阀可能改变半导体制造的三大原因

了解原子层沉积 (ALD) 阀门技术的前沿创新如何改变高科技半导体制造商的游戏规则。

解锁元素周期表中更多的元素

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