Swagelok® Ultrahigh-Purity Diaphragm Valves for Atomic Layer Processing (ALD3 and ALD6 Series)
Swagelok ALD3 and ALD6 series diaphragm valves are used in semiconductor manufacturing tools to achieve the controlled dosing necessary for atomic layer deposition (ALD) processing. They offer ultrahigh cycle life, high-speed actuation, and flow coefficients up to 0.62.
Request ALD Valve InformationUltrahigh-purity Swagelok® ALD3 and Swagelok® ALD6 diaphragm valves are designed to provide semiconductor manufacturers with dependable, high-speed dosing of precursor gases used to build up microchips layer by layer in deposition chambers. These high-performance ultrahigh-purity valves feature an ultrahigh cycle life, full immersibility at elevated temperatures, and suitability for ultrahigh-purity applications.
The diaphragms used in ALD3 and ALD6 valves are composed of a cobalt-based superalloy material that provides strength and corrosion resistance. Their valve bodies are 316L VIM-VAR stainless steel, making them suitable for ultrahigh-purity applications. The valve seats are made of fluorinated high-purity PFA to enable a broad range of chemical compatibility and resistance to swelling and contamination. These valves can be set up for normally closed and normally open pneumatic actuation, and they are available in a variety of configurations to suit different installation requirements.
See How ALD Valves Improve Semiconductor Manufacturing
ALD3 and ALD6 Valve Specifications
| Working Pressure | Vacuum to 145 psig (10.0 bar) |
| Burst Pressure | >3200 psig (220 bar) |
| Actuation Pressure | 50 to 90 psig (3.5 to 6.2 bar) |
| Temperature | 32° to 392°F (0° to 200°C) |
| Flow Coefficient (Cv) | 0.27 or 0.62 |
| Body Materials | 316L VIM-VAR stainless steel |
| Diaphragm Material | Cobalt-based superalloy |
| End Connections | Type (Size): Female VCR® face seal fitting (1/4 in. to 1/2 in.), male VCR face seal fitting (1/4 in. to 1/2 in.), modular surface mount high-flow C-seal (1.125 in. to 1.5 in.) |
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ALD3 and ALD6 Series Valves Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
원자층 증착 (ALD) 용 다이어프램 밸브 고속 개폐 시에도 매우 긴 수명 유지 ; Cv 범위 0.27 ~ 0.62; 고온용 개폐기로 200°C (392°F)까지 사용가능; 전자 개폐기 위치 감지 옵션; 초고순도 사양에 적합한 316L VIM-VAR 스텐레스강 몸체; VCR®, 튜브 맞대기 용접 및 블럭 조립식 연결구
Improve Semiconductor Yield with Optimized Alloys
Discover how semiconductor fabricators can improve end-to-end production yields and improve long-term profitability by selecting the right metals for critical fluid system components.
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1つの新しいバルブが半導体製造を変える3つの理由
今回は、原子層蒸着（ALD）バルブの最新テクノロジーが、ハイテク半導体メーカーにもたらす影響について紹介します。
Q&A：半導体製造の過去・現在・将来
半導体装置メーカー、マイクロデバイス・メーカー、流体システム・ソリューションのプロバイダーが連携することで、数十年間にわたっていかにして半導体市場はムーアの法則の要求に追いつくことができたのでしょうか。これからの展望と併せて紹介します。
光ファイバー装置メーカー、カスタマイズされたソリューションで効率アップを実現
ローゼンダール・ネクストロム社は、1980年代からスウェージロックのサポートを受けて、ビジネスを推進してきました。競合他社とは一線を画し、業界のトップを走り続けるローゼンダール・ネクストロム社のソリューション事例を紹介します。
最先端科学で信頼できる流体システム・ソリューション
フィンランドの希釈冷凍機メーカーであるブルーフォース社が、量子コンピューターや実験物理学などに欠かせない流体システム部品やソリューションに関して、スウェージロックに信頼を寄せている理由を紹介します。