Swagelok^® Atomic Layer Deposition (ALD) Valves

Swagelok ultrahigh-purity atomic layer deposition (ALD) valves offer the ultrahigh cycle life, high-speed actuation, flow rates, thermal immersibility, and extreme cleanliness needed to enable precise dosing and maximize chip yield in advanced semiconductor manufacturing applications.

Request ALD Valve Information

Since introducing the world to ALD valves, we have worked closely with semiconductor tool OEMs and fabs to deliver advanced ALD valve technology that provides the extreme levels of precision, consistency, cleanliness, and high cycle life necessary to keep up with the quick pace of innovation in the marketplace. Swagelok^® ALD valves can support increased chip production efficiency and overcome the challenges that are often associated with ALD processes.

Our ALD ultrahigh-purity valves feature:

Ultrahigh cycle life with high-speed actuation
C_v ranging from 0.27 to 1.7
Temperature capability up to 392°F (200°C) for specified models
Electronic or optical actuator position-sensing option
Cleanliness suitability for ultrahigh-purity applications
Modular surface mount, tube butt weld, and VCR^® end connections

See How ALD Valves Solve Challenges

원자층 증착(ALD) 밸브 카탈로그

구성 재질, 압력 및 온도 등급, 옵션, 액세서리를 포함한 자세한 제품 정보를 찾을 수 있습니다.

Мембранные клапаны для напыления с точностью до атомного слоя ALD

Характеристики: Сверхвысокий циклический срок службы с высокой скоростью срабатывания; Cv в диапазоне от 0,27 до 0,62; возможность работы при температуре до 392 °F (200 °C) с термостойкими приводами; вариант исполнения с электронным датчиком положения привода; подходят для применения в сверхчистых системах с корпусом из нержавеющей стали 316L VIM-VAR; торцевые соединения VCR®, под приварку встык и модульные торцевые соединения для монтажа на поверхность.

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