Swagelok® Ultrahigh-Purity Diaphragm Valves for Atomic Layer Processing (ALD7 Series)
The Swagelok ALD7 ultrahigh-purity valve provides the flow consistency and capacity, actuator speed, temperature rating, and cleanliness necessary to help maximize chip throughput in new or existing semiconductor manufacturing tools.
Request ALD7 Valve InformationThe Swagelok® ALD7 ultrahigh-purity diaphragm valve for atomic layer deposition (ALD) processing enables semiconductor tool manufacturers and chip fabricators to increase viable chip yields and enhances profitability by enabling the flow consistency and capacity, actuator speed, and performance at high temperatures necessary to overcome production processes limitations. It provides consistent performance from valve to valve, dose to dose, and chamber to chamber over an ultrahigh cycle life.
The Swagelok ALD7 valve:
- Delivers quick, precise dosing over the course of millions of cycles in even the most demanding applications and features enhanced actuator technology with a response time as low as 5 ms
- Is resistant to corrosive gases with a valve body comprised of proprietary ultrahigh-purity Swagelok 316L VIM-VAR stainless steel
- Can be heated up to 200°C while keeping the pneumatic actuator below maximum operating temperature of 150°C
- Delivers a flow coefficient (Cv) up to 0.7 (with optional custom (factory-set) versions available that deliver a flow coefficient of 0.5–0.7 Cv)
- Maintains the same footprint as Swagelok industry-standard ALD valves and features an integrated thermal isolator to maximize limited space near the reaction chamber
ALD7 Valve Specifications
| Working Pressure | Vacuum to 145 psig (10.0 bar) |
| Burst Pressure | >3200 psig (220 bar) |
| Actuation Pressure | 60 to 120 psig (4.1 to 8.27 bar) |
| Temperature Rating | Standard valve body from 32°F (0°C) to 392°F (200°C) |
| Flow Coefficient | Standard 0.7 Cv (factory set) |
| Body Materials | 316L VIM-VAR stainless steel |
| Diaphragm Material | Cobalt-based superalloy |
| End Connections | Type: VCR® fittings, tube butt weld, 1.5 in. modular surface-mount high flow C-seal |
Have questions about ALD valves?
ALD7 Series Valves Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
■ サイクル・ライフが非常に優れ、高速で開閉可能／■ 流量係数（Cv 値）：0.27 から1.7 まで／■ 最高使用温度：200°C（ALD20 の場合）／■ オプション：電気式インジケーター、光学式ポジション・センサーなど／■ 超高純度用途に適した316L VIM-VAR ステンレス鋼製ボディ／■ エンド・コネクション・タイプ：集積モデル、チューブ突き合わせ溶接、VCR ® メタル・ガスケット式面シール継手
How to Solve Top ALD and ALE Semiconductor Processing Challenges
ALD and ALE semiconductor production processes come with some inherent challenges and complexities. Learn how the right selection of process valves can help you overcome them.
Select the Right Valves for ALD ChallengesSwagelok Resources Curated for You
Mejorar el Rendimiento de los Semiconductores con Aleaciones Optimizadas
Vea cómo los fabricantes de semiconductores pueden mejorar el rendimiento de la producción de extremo a extremo, y mejorar la rentabilidad a largo plazo mediante la selección de los metales adecuados para los componentes críticos de los sistemas de fluidos.
P&R: Pasado, Presente y Futuro de la Fabricación de Semiconductores
Vea cómo la colaboración entre los fabricantes de herramientas, los fabricantes de microchips y los proveedores de soluciones para sistemas de fluidos ha permitido que el mercado del semiconductor se mantenga a la altura de las exigencias de la Ley de Moore durante décadas, y hacia dónde nos dirigimos a partir de aquí.
Производитель оптоволоконного оборудования повышает эффективность с помощью индивидуальных решений
С 1980-х годов Rosendahl Nextrom полагается на компанию Swagelok в развитии своего бизнеса. Узнайте больше о решениях, которые позволили компании опередить конкурентов и остаться в числе отраслевых лидеров.
Надежные решения в жидкостных и газовых системах для новых научно-исследовательских возможностей
Узнайте, почему финская компания-производитель криогенных рефрижераторов Bluefors доверяет компонентам и решениям Swagelok для жидкостных и газовых систем, которые способствуют развитию сферы квантовых вычислений, экспериментальной физики и других направлений.