Swagelok^® Ultrahigh-Purity Diaphragm Valves for Atomic Layer Processing (ALD3 and ALD6 Series)

Swagelok ALD3 and ALD6 series diaphragm valves are used in semiconductor manufacturing tools to achieve the controlled dosing necessary for atomic layer deposition (ALD) processing. They offer ultrahigh cycle life, high-speed actuation, and flow coefficients up to 0.62.

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Ultrahigh-purity Swagelok^® ALD3 and Swagelok^® ALD6 diaphragm valves are designed to provide semiconductor manufacturers with dependable, high-speed dosing of precursor gases used to build up microchips layer by layer in deposition chambers. These high-performance ultrahigh-purity valves feature an ultrahigh cycle life, full immersibility at elevated temperatures, and suitability for ultrahigh-purity applications.

The diaphragms used in ALD3 and ALD6 valves are composed of a cobalt-based superalloy material that provides strength and corrosion resistance. Their valve bodies are 316L VIM-VAR stainless steel, making them suitable for ultrahigh-purity applications. The valve seats are made of fluorinated high-purity PFA to enable a broad range of chemical compatibility and resistance to swelling and contamination. These valves can be set up for normally closed and normally open pneumatic actuation, and they are available in a variety of configurations to suit different installation requirements.

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ALD3 and ALD6 Valve Specifications

Working Pressure	Vacuum to 145 psig (10.0 bar)
Burst Pressure	>3200 psig (220 bar)
Actuation Pressure	50 to 90 psig (3.5 to 6.2 bar)
Temperature	32° to 392°F (0° to 200°C)
Flow Coefficient (C_v)	0.27 or 0.62
Body Materials	316L VIM-VAR stainless steel
Diaphragm Material	Cobalt-based superalloy
End Connections	Type (Size): Female VCR^® face seal fitting (1/4 in. to 1/2 in.), male VCR face seal fitting (1/4 in. to 1/2 in.), modular surface mount high-flow C-seal (1.125 in. to 1.5 in.)

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ALD3 and ALD6 Series Valves Catalogs

Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.

超高純度用バルブ原子層プロセス用

■ サイクル・ライフが非常に優れ、高速で開閉可能／■ 流量係数（Cv 値）：0.27 から1.7 まで／■ 最高使用温度：200°C（ALD20 の場合）／■ オプション：電気式インジケーター、光学式ポジション・センサーなど／■ 超高純度用途に適した316L VIM-VAR ステンレス鋼製ボディ／■ エンド・コネクション・タイプ：集積モデル、チューブ突き合わせ溶接、VCR ® メタル・ガスケット式面シール継手

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Swagelok fluid system components are available in materials designed to last in semiconductor manufacturing environments.

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